COMPOL - Silicon and Exotic Material Polish

COMPOL is a colloidal silica slurry developed especially for polishing metals, ceramics, and electronic substrates such as lithium tantalate (LiTaO3), lithium niobate (LiNbO3), and sapphire. With excellent particle uniformity and dispersal, it delivers a high removal rate and damage-free polishing.

COMPOL-50AD and COMPOL-50S combine colloidal silica slurry with special organic amines that produce a high-removal-rate for primary and secondary polishing of silicon wafers. Even at high dilutions, COMPOL delivers excellent processing efficiency and long slurry life.

Typical Physical Properties of COMPOL

Product Physical Properties Applications
Content of SiO2 pH Specific Gravity Average Particle Size (nm)
20 40 9.2 1.300 15.0 Sapphire, CaF2, BGO, LiTaO3, LiNbO3, and other oxide crystals
50 40 10.2 1.300 40.0
80 40 10.2 1.300 72.0
120 40 9.2 1.300 82.5
EX-3 50 9.5 1.385 32.5
403 46 9.3 1.340 39.0


Product Stats:


BGO Polishing, Glass Photomask, Ferrite Ceramics Polishing, Ni-P Disk Polishing, LiNbO3 Polishing, Crystal Polishing, PZT Ceramics Polishing, Barium Titanate Ceramics Polishing, Super Hard Metal Polishing, Bare Silicon Second Polishing, Alumina Ceramics Polishing, CaF2 Polishing, Bare Silicon First Polishing, LiTaO3 Polishing, Sic Ceramics Polishing, Sapphire Polishing, Electronic Substrates Polishing, Ceramics Polishing, Metals Polishing, Oxide Crystal Polishing

Polishing Slurry

Colloidal Silica