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  • FS - Fujimi Skin

    FS, Fujimi Skin, is made from high-purity alumina powder (at least 99.9% pure) and is recommended for the final polishing process in the production of contact lenses and precision machine parts.

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  • FZ - Glass and Metal Polish

    FZ-05 and FZ-02 consist of ultra-fine zirconium oxide particles and are optimal for polishing special metals such as molybdenum, tungsten, chromium, titanium, nickel, and their alloys.

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  • GC - Green Silicon Carbide

    GC (green silicon carbide) is a very high-purity silicon carbide (SiC) lapping powder produced by reacting silica and coke in an electric furnace at a temperature greater than 2000 C.

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  • GLANZOX - Silicon Polish

    GLANZOX is a colloidal silica suspended in liquid plus special ingredients.

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  • GLANZOX E-SERIES - Edge Polish

    GLANZOX E-Series high-efficiency polish is used for mirror finishing of wafer edge surfaces.

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  • INSEC - Intermetallic Semiconductor Polish

    The INSEC series produces a high-precision mirror finish on semiconductors.

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  • MoB/CoCr - DTS

    A developmental product, Fujimi's Molybdenum-Boron (MoB) and Cobalt-Chromium (CoCr) composite is an agglomerated and sintered material used for thermal spray applications.

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  • MoB/NiCr - DTS

    A developmental product, Fujimi's Molybdenum-Boron (MoB) and Nichrome (NiCr) composite is an agglomerated and sintered material used for thermal spray applications.

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  • PLANERLITE 4000 SERIES - CMP Slurry

    Fujimi's PLANERLITE 4000 series of CMP polishing slurries are designed for use on SiO2 films (interlayer dielectric/ILD, shallow trench isolation/STI).

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  • PLANERLITE 5000 SERIES - CMP Slurry

    Fujimi's PLANERLITE 5000 series of CMP polishing slurries are applied exclusively to metal wiring or plugs used for the circuits of VLSI (Very-Large-Scale Integration) devices.

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